发明公开
- 专利标题: Transistor having increased breakdown voltage
- 专利标题(中): 晶体管miterhöhterDurchbruchspannung
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申请号: EP13153374.7申请日: 2013-01-31
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公开(公告)号: EP2629332A2公开(公告)日: 2013-08-21
- 发明人: Briere, Michael A. , Thapar, Naresh , Garg, Reenu
- 申请人: International Rectifier Corporation
- 申请人地址: 101 N. Sepulveda Blvd. El Segundo, CA 90245 US
- 专利权人: International Rectifier Corporation
- 当前专利权人: International Rectifier Corporation
- 当前专利权人地址: 101 N. Sepulveda Blvd. El Segundo, CA 90245 US
- 代理机构: Dr. Weitzel & Partner
- 优先权: US201261600469P 20120217; US201313749477 20130124
- 主分类号: H01L29/417
- IPC分类号: H01L29/417 ; H01L29/423 ; H01L29/778
摘要:
There are disclosed herein various implementations of a transistor having an increased breakdown voltage. Such a transistor includes a source finger electrode having a source finger electrode beginning and a source finger electrode end. The transistor also includes a drain finger electrode with a curved drain finger electrode end having an increased radius of curvature. The resulting decreased electric field at the curved drain finger electrode end allows for an increased breakdown voltage and a more robust and reliable transistor. In some implementations, the curved drain finger electrode end may be extended beyond the source finger electrode beginning to achieve the increased breakdown voltage.
公开/授权文献
- EP2629332B1 Transistor having increased breakdown voltage 公开/授权日:2018-01-17
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