发明公开
- 专利标题: PROCEDE DE GRAVURE DE COUCHES MICRO-ELECTRIQUES PAR UN FAISCEAU LASER
- 专利标题(英): Method for etching micro-electrical films using a laser beam
- 专利标题(中): 法蚀刻电子用微型薄膜用激光束来
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申请号: EP11811050.1申请日: 2011-12-08
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公开(公告)号: EP2666194A1公开(公告)日: 2013-11-27
- 发明人: SEILER, Anne-Laure , BENWADIH, Mohammed
- 申请人: Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- 申请人地址: 25, rue Leblanc Bâtiment "Le Ponant D" 75015 Paris FR
- 专利权人: Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- 当前专利权人: Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- 当前专利权人地址: 25, rue Leblanc Bâtiment "Le Ponant D" 75015 Paris FR
- 代理机构: Cabinet Laurent & Charras
- 优先权: FR1150350 20110117
- 国际公布: WO2012098302 20120726
- 主分类号: H01L51/00
- IPC分类号: H01L51/00 ; H01L51/10
摘要:
The invention relates to a method whereby a laser beam having a pre-determined wavelength is used to etch a zone (16) of a film (14) of a first material, said zone (16) being deposited on the surface of at least two materials (10, 12). The method consists in: depositing a film (18) of a third material on the film (14) of first material, the first and third materials having a chemical affinity during the application of the laser beam that is greater than the chemical affinity during the application between the first material and each of said at least two second materials; and applying the laser beam to a zone of a free surface of the film (18) of third material vertically above the zone (16) of the film (14) of first material, with a fluence of the laser beam causing the separation of said zone (16).
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