发明公开
- 专利标题： A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-xGex MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND
- 专利标题（中）： 用于生产半导体器件利用元素锗及/或SI1-xGex材料使用CMP成分与特定的有机化合物的化学机械抛光
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申请号： EP12819882.7申请日： 2012-07-30
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公开(公告)号： EP2742103A2公开(公告)日： 2014-06-18
- 发明人: NOLLER, Bastian Marten , DRESCHER, Bettina , GILLOT, Christophe , LI, Yuzhuo , GAO, Ning
- 申请人： BASF SE
- 申请人地址： 67056 Ludwigshafen DE
- 专利权人： BASF SE
- 当前专利权人： BASF SE
- 当前专利权人地址： 67056 Ludwigshafen DE
- 优先权： US201161513694P 20110801
- 国际公布： WO2013018015 20130207
- 主分类号： C09G1/02
- IPC分类号： C09G1/02
摘要：
A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si
1-x Ge
x material with 0.1 ≤ x 11 R
12 R
13 R
14 ]
+ , wherein {k} is 1, 2 or 3, (Z) is a hydroxyl (-OH), alkoxy (-OR
1 ), heterocyclic alkoxy (-OR
1 as part of a heterocyclic structure), carboxylic acid (-COOH), carboxylate (-COOR
2 ), amino (-NR
3 R
4 ), heterocyclic amino (-NR
3 R
4 as part of a heterocyclic structure), imino (=N-R
5 or -N=R
6 ), heterocyclic imino (=N-R
5 or -N=R
6 as part of a heterocyclic structure), phosphonate (-P(=0)(OR
7 )(OR
8 ) ), phosphate (-0-P(=0)(OR
9 )(OR
10 ) ), phosphonic acid (-P(=0)(OH)
2 ), phosphoric acid (-0-P(=0)(OH)
2 ) moiety, or their protonated or deprotonated forms, R
1 , R
2 , R
7 , R
9 is - independently from each other - alkyl, aryl, alkylaryl, or arylalkyl, R
3 , R
4 , R
5 , R
8 , R
10 is - independently from each other - H, alkyl, aryl, alkylaryl, or arylalkyl, R
6 is alkylene, or arylalkylene, R
11 , R
12 , R
13 is - independently from each other - H, alkyl, aryl, alkylaryl, or arylalkyl, and R
11 , R
12 , R
13 does not comprise any moiety (Z), R
14 is alkyl, aryl, alkylaryl, or arylalkyl, and R
14 does not comprise any moiety (Z), and (D) an aqueous medium.
1-x Ge
x material with 0.1 ≤ x 11 R
12 R
13 R
14 ]
+ , wherein {k} is 1, 2 or 3, (Z) is a hydroxyl (-OH), alkoxy (-OR
1 ), heterocyclic alkoxy (-OR
1 as part of a heterocyclic structure), carboxylic acid (-COOH), carboxylate (-COOR
2 ), amino (-NR
3 R
4 ), heterocyclic amino (-NR
3 R
4 as part of a heterocyclic structure), imino (=N-R
5 or -N=R
6 ), heterocyclic imino (=N-R
5 or -N=R
6 as part of a heterocyclic structure), phosphonate (-P(=0)(OR
7 )(OR
8 ) ), phosphate (-0-P(=0)(OR
9 )(OR
10 ) ), phosphonic acid (-P(=0)(OH)
2 ), phosphoric acid (-0-P(=0)(OH)
2 ) moiety, or their protonated or deprotonated forms, R
1 , R
2 , R
7 , R
9 is - independently from each other - alkyl, aryl, alkylaryl, or arylalkyl, R
3 , R
4 , R
5 , R
8 , R
10 is - independently from each other - H, alkyl, aryl, alkylaryl, or arylalkyl, R
6 is alkylene, or arylalkylene, R
11 , R
12 , R
13 is - independently from each other - H, alkyl, aryl, alkylaryl, or arylalkyl, and R
11 , R
12 , R
13 does not comprise any moiety (Z), R
14 is alkyl, aryl, alkylaryl, or arylalkyl, and R
14 does not comprise any moiety (Z), and (D) an aqueous medium.
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