发明公开
EP2754179A1 SCHOTTKY DIODE EMPLOYING RECESSES FOR ELEMENTS OF JUNCTION BARRIER ARRAY
有权
肖特二氧化锰麻醉品AUSSPARUNGENFÜRELEMENTE AUS EINER BINDUNGSBARRIERENANORDNUNG
- 专利标题: SCHOTTKY DIODE EMPLOYING RECESSES FOR ELEMENTS OF JUNCTION BARRIER ARRAY
- 专利标题(中): 肖特二氧化锰麻醉品AUSSPARUNGENFÜRELEMENTE AUS EINER BINDUNGSBARRIERENANORDNUNG
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申请号: EP12766237.7申请日: 2012-09-07
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公开(公告)号: EP2754179A1公开(公告)日: 2014-07-16
- 发明人: HENNING, Jason, Patrick , ZHANG, Qingchun , RYU, Sei-Hyung , AGARWAL, Anant, Kumar , PALMOUR, John, Williams , ALLEN, Scott
- 申请人: Cree, Inc.
- 申请人地址: 4600 Silicon Drive Durham, NC 27703 US
- 专利权人: Cree, Inc.
- 当前专利权人: Cree, Inc.
- 当前专利权人地址: 4600 Silicon Drive Durham, NC 27703 US
- 代理机构: Boyce, Conor
- 优先权: US201113229750 20110911
- 国际公布: WO2013036724 20130314
- 主分类号: H01L29/872
- IPC分类号: H01L29/872 ; H01L29/861 ; H01L29/06
摘要:
The present disclosure generally relates to a Schottky diode that has a substrate, a drift layer provided over the substrate, and a Schottky layer provided over an active region of the substrate. A junction barrier array is provided in the drift layer just below the Schottky layer. The elements of the junction barrier array are generally doped regions in the drift layer. To increase the depth of these doped regions, individual recesses may be formed in the surface of the drift layer where the elements of the junction barrier array are to be formed. Once the recesses are formed in the drift layer, areas about and at the bottom of the recesses are doped to form the respective elements of the junction barrier array.
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