发明授权
- 专利标题: FABRICATION OF NANOPORES USING HIGH ELECTRIC FIELDS
- 专利标题(中): 备纳米多孔强电场
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申请号: EP13787530.8申请日: 2013-05-07
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公开(公告)号: EP2847367B1公开(公告)日: 2017-03-29
- 发明人: KWOK, Wing Hei , TABARD-COSSA, Vincent , BRIGGS, Kyle, Alexander, Zarkel
- 申请人: The University of Ottawa
- 申请人地址: 3042-800 King Edward Ottawa, Ontario K1N 6N5 CA
- 专利权人: The University of Ottawa
- 当前专利权人: The University of Ottawa
- 当前专利权人地址: 3042-800 King Edward Ottawa, Ontario K1N 6N5 CA
- 代理机构: Bittner, Thomas L.
- 优先权: US201261643651P 20120507; US201361781081P 20130314
- 国际公布: WO2013167955 20131114
- 主分类号: C25F3/14
- IPC分类号: C25F3/14 ; B23B41/14 ; B23H9/14 ; B23K9/013 ; B82Y30/00 ; C25F7/00 ; B81C1/00 ; B01D65/02 ; B01D67/00 ; G01B7/00 ; G01N33/487
摘要:
A method is provided for fabricating a nanopore in a membrane. The method includes: applying an electric potential across the membrane, where value of the electric potential is selected to induce an electric field which causes a leakage current across the membrane; monitoring current flow across the membrane while the electric potential is being applied; detecting an abrupt increase in the leakage current across the membrane; and removing the electric potential across the membrane in response to detecting the abrupt increase in the leakage current.
公开/授权文献
- EP2847367A1 FABRICATION OF NANOPORES USING HIGH ELECTRIC FIELDS 公开/授权日:2015-03-18
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