发明公开
EP2859023A1 NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF
有权
中性层用于定向自组装及其方法聚合物组合物
- 专利标题： NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF
- 专利标题（中）： 中性层用于定向自组装及其方法聚合物组合物
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申请号： EP13725273.0申请日： 2013-05-14
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公开(公告)号： EP2859023A1公开(公告)日： 2015-04-15
- 发明人: WU, Hengpeng , POLISHCHUK, Orest , CAO, Yi , HONG, SungEun , YIN, Jian , LIN, Guanyang , PAUNESCU, Margareta , NEISSER, Mark
- 申请人： AZ Electronic Materials (Luxembourg) S.à.r.l.
- 申请人地址： 32-36, Boulevard d`Avranches 1160 Luxembourg LU
- 专利权人： AZ Electronic Materials (Luxembourg) S.à.r.l.
- 当前专利权人： AZ Electronic Materials (Luxembourg) S.à.r.l.
- 当前专利权人地址： 32-36, Boulevard d`Avranches 1160 Luxembourg LU
- 代理机构： Steinbusch, Daniel
- 优先权： US201213492125 20120608
- 国际公布： WO2013182269 20131212
- 主分类号： C08F4/04
- IPC分类号： C08F4/04 ; C08F8/14 ; G03F7/00
摘要：
The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1), wherein R
1 represents a C
1 -C
20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen(O) or nitrogen (N), and R
d is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
1 represents a C
1 -C
20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen(O) or nitrogen (N), and R
d is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
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