发明公开
EP2873088A4 ENDPOINTING FOR FOCUSED ION BEAM PROCESSING 审中-公开
离子束处理终止点确定FOCUSED

ENDPOINTING FOR FOCUSED ION BEAM PROCESSING
摘要:
To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.
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