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    ION IMPLANTATION TO ALTER ETCH RATE
    1.
    发明公开
    ION IMPLANTATION TO ALTER ETCH RATE 有权
    IONENIMPLANTATION ZUR VERNDNDUNG EINERÄTZGESCHWINDIGKEIT

    公开(公告)号：EP2943769A4

    公开(公告)日：2016-08-17

    申请号：EP14737997

    申请日：2014-01-10

    申请人： FEI CO

    发明人： FOORD DAVID ,  RUE CHAD

    IPC分类号： H01J37/305 ,  G01N1/32 ,  H01J37/317

    CPC分类号： H01J37/3056 ,  G01N1/32 ,  H01J37/3171 ,  H01J2237/31713 ,  H01J2237/31745 ,  H01J2237/31749 ,  Y10T428/24479

    摘要： Implanting a material in a pattern hardens the material in the pattern for subsequent etching. When the region is etched, by ion beam sputtering, chemically enhanced charged particle beam etching, or chemical etching, a thicker structure remains because of the reduced etch rate of the hardened pattern. The invention is particularly useful for the preparation of thin lamella for viewing on a transmission electron microscope.

    摘要翻译： 将图案中的材料植入硬化图案中的材料以进行后续蚀刻。 当该区域被蚀刻时，通过离子束溅射，化学增强的带电粒子束蚀刻或化学蚀刻，由于硬化图案的蚀刻速率降低，保留较厚的结构。 本发明特别可用于制备用于在透射电子显微镜上观察的薄片层。

    PREPARATION OF LAMELLAE FOR TEM VIEWING
    3.
    发明公开
    PREPARATION OF LAMELLAE FOR TEM VIEWING 审中-公开
    用于TEM保存的薄片的制造

    公开(公告)号：EP2852967A4

    公开(公告)日：2015-06-03

    申请号：EP13793928

    申请日：2013-05-21

    申请人： FEI CO

    发明人： FULLER SCOTT EDWARD ,  ROUTH JR BRIAN ROBERTS ,  MORIARTY MICHAEL

    IPC分类号： H01J37/30 ,  G01N1/32 ,  H01J37/08 ,  H01J37/302

    CPC分类号： H01J37/3026 ,  G01N1/32 ,  H01J2237/31745

    摘要： A method and apparatus for producing thin lamella for TEM observation. The steps of the method are robust and can be used to produce lamella in an automated process. In some embodiments, a protective coating have a sputtering rate matched to the sputtering rate of the work piece is deposited before forming the lamella. In some embodiments, the bottom of the lamella slopes away from the feature of interest, which keeps the lamella stable and reduces movement during thinning. In some embodiments, a fiducial is used to position the beam for the final thinning, instead of using an edge of the lamella. In some embodiments, the tabs are completed after high ion energy final thinning to keep the lamella more stable. In some embodiments, a defocused low ion energy and pattern refresh delay is used for the final cut to reduce deformation of the lamella.