发明公开
EP2873089A2 DEVICE AND PROCESS FOR PREVENTING SUBSTRATE DAMAGES IN A DBD PLASMA INSTALLATION
有权
DEVICE AND METHOD FOR HOT电弧的IN A DBD等离子体系统预防
- 专利标题: DEVICE AND PROCESS FOR PREVENTING SUBSTRATE DAMAGES IN A DBD PLASMA INSTALLATION
- 专利标题(中): DEVICE AND METHOD FOR HOT电弧的IN A DBD等离子体系统预防
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申请号: EP13765474.5申请日: 2013-07-09
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公开(公告)号: EP2873089A2公开(公告)日: 2015-05-20
- 发明人: TIXHON, Eric , LECLERCQ, Joseph , MICHEL, Eric
- 申请人: Asahi Glass Co., Ltd.
- 申请人地址: Shin-Marunouchi Building 1-5-1, Marunouchi Chiyoda-ku Tokyo 100-8405 JP
- 专利权人: Asahi Glass Co., Ltd.
- 当前专利权人: Asahi Glass Co., Ltd.
- 当前专利权人地址: Shin-Marunouchi Building 1-5-1, Marunouchi Chiyoda-ku Tokyo 100-8405 JP
- 代理机构: Larangé, Françoise
- 优先权: EP12175855 20120711; EP12199072 20121221
- 国际公布: WO2014009883 20140116
- 主分类号: H01J37/32
- IPC分类号: H01J37/32
摘要:
The present invention relates to a process for preventing substrate damages in an installation for surface treatment by dielectric barrier discharge (DBD) and a surface treatment DBD installation for carrying out such process. It comprises: - detecting the amplitude of the voltage at the terminals of the electrodes and the amplitude of the current circulating between said electrodes; - defining the maximum number of alternations of voltage at the terminals of the electrodes in the presence of a hot electric arc (n max) in order not to exceed 50 Joules as dissipated energy in said substrate; - when a hot electric arc appears between said electrodes, modifying with inverse feedback the voltage at the terminals of said electrodes before the defined maximum number of alternations of voltage at the terminals of the electrodes is reached.
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