发明公开
EP2902395A1 Tantalum organic precursors and their use for vapor phase deposition of tantalum containing films
审中-公开
有机钽前驱物和其用于含钽薄膜的气相涂层使用
- 专利标题： Tantalum organic precursors and their use for vapor phase deposition of tantalum containing films
- 专利标题（中）： 有机钽前驱物和其用于含钽薄膜的气相涂层使用
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申请号： EP14305117.5申请日： 2014-01-30
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公开(公告)号： EP2902395A1公开(公告)日： 2015-08-05
- 发明人: Correia Anacleto, Antony , Lachaud, Christophe , Pinchart, Audrey , Zauner, Andreas
- 申请人： L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- 申请人地址： 75, Quai d'Orsay 75007 Paris FR
- 专利权人： L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- 当前专利权人： L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- 当前专利权人地址： 75, Quai d'Orsay 75007 Paris FR
- 代理机构： Grout de Beaufort, François-Xavier
- 主分类号： C07F9/00
- IPC分类号： C07F9/00 ; C23C16/455 ; H01L21/285
摘要：
Compounds of formula (I): M(R 1 CS 2 )R 2 R 3 NR 6
R 1 , R 2 , R 3 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
R 6 is an organic ligand being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylsylilamine group.
M is tantalum.
R 1 , R 2 , R 3 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
R 6 is an organic ligand being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylsylilamine group.
M is tantalum.
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