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1.发明公开Novel dithiocarbamate vanadium organic precursors and their use for vapor phase deposition of vanadium containing films 审中-公开新颖有机二硫代氨基甲酸钒前体和它们对含钒膜的气相涂层使用
公开(公告)号：EP2902393A1
公开(公告)日：2015-08-05
申请号：EP14305113.4
申请日：2014-01-29
IPC分类号： C07F9/00 , C23C16/455 , H01L21/285
CPC分类号： C07F9/005 , C23C16/34 , C23C16/405 , C23C16/45553 , H01L21/28556 , H01L21/28562 , H01L21/76841
摘要： Compounds of formula (I) : M(R 1 CS 2 )R 2 R 3 R 4 R 5
R 1 , R 2 , R 3 , R 4 , R 5 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
M is Vanadium (V).摘要翻译： 式（I）的化合物：M（R 1 CS 2）R 2 R 3 R 4 R 5 R 1，R 2，R 3，R 4，R 5是有机配体H中被独立地选择，C1-C4烷基 直链或支链的，芳基，甲硅烷基，烷基，alkylsylilamine基。 M为钒（V）。
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2.发明公开Niobium organic precursors and their use for vapor phase deposition of niobium containing films 审中-公开有机Niobvorläufer及其对含铌薄膜的气相涂层使用
公开(公告)号：EP2902398A1
公开(公告)日：2015-08-05
申请号：EP14305140.7
申请日：2014-01-31
CPC分类号： C07F9/005 , H01L21/28556 , H01L21/28562 , H01L21/76841
摘要： Compounds of formula (I): M(R 1 CS 2 )R 2 R 3 NR 6
R 1 , R 2 , R 3 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
R 6 is an organic ligand being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylsylilamine group.
M is niobium.摘要翻译： 式（I）的化合物：M（R 1 CS 2）R 2 R 3 NR 6 R 1，R 2，R 3是有机配体正在H，C1-C4烷基线性独立选择的或支链的，芳基，甲硅烷基 基，烷基胺基团，alkylsylilamine基。 R 6为在H，C1-C4烷基直链被独立选择的或支链的有机配体，芳基，甲硅烷基，alkylsylilamine基。 M是铌。
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3.发明公开Novel dithiocarbamate tantalum organic precursors and their use for vapor phase deposition of tantalum containing films 审中-公开新颖有机二硫代氨基甲酸钽前驱物和其用于含钽薄膜的气相涂层使用
公开(公告)号：EP2902396A1
公开(公告)日：2015-08-05
申请号：EP14305118.3
申请日：2014-01-30
IPC分类号： C07F9/00 , C23C16/455 , H01L21/285
CPC分类号： C07F9/005 , C23C16/308 , C23C16/45553 , H01L21/28556 , H01L21/28562 , H01L21/76841
摘要： Compounds of formula (I) : M(R 1 CS 2 )R 2 R 3 R 4 R 5
R 1 , R 2 , R 3 , R 4 , R 5 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
M is tantalum.摘要翻译： 式（I）的化合物：M（R 1 CS 2）R 2 R 3 R 4 R 5 R 1，R 2，R 3，R 4，R 5是有机配体H中被独立地选择，C1-C4烷基 直链或支链的，芳基，甲硅烷基，烷基，alkylsylilamine基。 M是钽。
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4.发明公开Tantalum organic precursors and their use for vapor phase deposition of tantalum containing films 审中-公开有机钽前驱物和其用于含钽薄膜的气相涂层使用
公开(公告)号：EP2902395A1
公开(公告)日：2015-08-05
申请号：EP14305117.5
申请日：2014-01-30
IPC分类号： C07F9/00 , C23C16/455 , H01L21/285
CPC分类号： C07F9/005 , C23C16/18 , C23C16/34 , C23C16/45553 , H01L21/28556 , H01L21/28562 , H01L21/76841
摘要： Compounds of formula (I): M(R 1 CS 2 )R 2 R 3 NR 6
R 1 , R 2 , R 3 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
R 6 is an organic ligand being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylsylilamine group.
M is tantalum.摘要翻译： 式（I）的化合物：M（R 1 CS 2）R 2 R 3 NR 6 R 1，R 2，R 3是有机配体正在H，C1-C4烷基线性独立选择的或支链的，芳基，甲硅烷基 基，烷基胺基团，alkylsylilamine基。 R 6为在H，C1-C4烷基直链被独立选择的或支链的有机配体，芳基，甲硅烷基，alkylsylilamine基。 M是钽。
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5.发明公开Novel dithiocarbamate niobium organic precursors and their use for vapor phase deposition of niobium containing films 审中-公开新颖有机二硫代氨基甲酸Niobiumvorläufer以及它们用于薄膜的气相涂层使用niobiumhaltigen
公开(公告)号：EP2902397A1
公开(公告)日：2015-08-05
申请号：EP14305139.9
申请日：2014-01-31
CPC分类号： C07F9/005 , C23C16/30 , C23C16/303 , C23C16/308 , C23C16/45531 , C23C16/45553
摘要： Compounds of formula (I): M(R 1 CS 2 )R 2 R 3 R 4 R 5
R 1 , R 2 , R 3 , R 4 , R 5 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
M is niobium.摘要翻译： 式（I）的化合物：M（R 1 CS 2）R 2 R 3 R 4 R 5 R 1，R 2，R 3，R 4，R 5是有机配体H中被独立地选择，C1-C4烷基 直链或支链的，芳基，甲硅烷基，烷基，alkylsylilamine基。 M是铌。
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6.发明公开Vanadium organic precursors and their use for vapor phase deposition of vanadium containing films 审中-公开有机钒前体和它们对含钒膜的气相涂层使用
公开(公告)号：EP2902394A1
公开(公告)日：2015-08-05
申请号：EP14305114.2
申请日：2014-01-29
IPC分类号： C07F9/00 , C23C16/455 , H01L21/285
CPC分类号： C07F9/005 , C23C16/18 , C23C16/34 , C23C16/45553 , H01L21/28556 , H01L21/28562 , H01L21/76841
摘要： Compounds of formula (I) : M(R 1 CS 2 )R 2 R 3 NR 6
R 1 , R 2 , R 3 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
R 6 is an organic ligand being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylsylilamine group.
M is Vanadium.摘要翻译： 式（I）的化合物：M（R 1 CS 2）R 2 R 3 NR 6 R 1，R 2，R 3是有机配体正在H，C1-C4烷基线性独立选择的或支链的，芳基，甲硅烷基 基，烷基胺基团，alkylsylilamine基。 R 6为在H，C1-C4烷基直链被独立选择的或支链的有机配体，芳基，甲硅烷基，alkylsylilamine基。 M是钒。
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