发明公开
EP2902397A1 Novel dithiocarbamate niobium organic precursors and their use for vapor phase deposition of niobium containing films 审中-公开
新颖有机二硫代氨基甲酸Niobiumvorläufer以及它们用于薄膜的气相涂层使用niobiumhaltigen

Novel dithiocarbamate niobium organic precursors and their use for vapor phase deposition of niobium containing films
摘要:
Compounds of formula (I): M(R 1 CS 2 )R 2 R 3 R 4 R 5

R 1 , R 2 , R 3 , R 4 , R 5 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
M is niobium.
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