发明公开
EP2950329A1 TRANSFER SYSTEM, EXPOSURE APPARATUS, TRANSFER METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUCTION APPARATUS
审中-公开
ÜBERTRAGUNGSSYSTEM，BELICHTUNGSVORRICHTUNG，ÜBERTRAGUNGSVERFAHREN，BELICHTUNGSVERFAHREN，VORRICHTUNGSHERSTELLUNGSVERFAHREN UND SAUGVORRICHTUNG
- 专利标题： TRANSFER SYSTEM, EXPOSURE APPARATUS, TRANSFER METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUCTION APPARATUS
- 专利标题（中）： ÜBERTRAGUNGSSYSTEM，BELICHTUNGSVORRICHTUNG，ÜBERTRAGUNGSVERFAHREN，BELICHTUNGSVERFAHREN，VORRICHTUNGSHERSTELLUNGSVERFAHREN UND SAUGVORRICHTUNG
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申请号： EP13859307.4申请日： 2013-11-27
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公开(公告)号： EP2950329A1公开(公告)日： 2015-12-02
- 发明人: HARA, Hideaki
- 申请人： Nikon Corporation
- 申请人地址： 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 JP
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 JP
- 代理机构： Hoffmann Eitle
- 优先权： US201261731892P 20121130
- 国际公布： WO2014084229 20140605
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/20 ; H01L21/677
摘要：
A carrier system is provided with a wafer stage (WST) which holds a mounted wafer (W) and is also movable along an XY plane, a chuck unit (153) which holds the wafer from above in a non-contact manner above a predetermined position and is vertically movable, and a plurality of vertical movement pins (140), which can support from below the wafer held by the chuck unit (153) on the wafer stage (WST) when the wafer stage (WST) is positioned at the predetermined position above and can also move vertically. Then, flatness of the wafer (W) is measured by a Z position detection system (146), and based on the measurement results, the chuck unit(153) and the vertical movement pins (140) that hold (support) the wafer (W) are independently driven.
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