• 专利标题: EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
  • 申请号: EP15178235.6
    申请日: 2007-01-19
  • 公开(公告)号: EP2963498B8
    公开(公告)日: 2017-07-26
  • 发明人: Shibazaki, Yuichi
  • 申请人: Nikon Corporation
  • 申请人地址: 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 JP
  • 专利权人: Nikon Corporation
  • 当前专利权人: Nikon Corporation
  • 当前专利权人地址: 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 JP
  • 代理机构: Hoffmann Eitle
  • 优先权: JP2006011506 20060119; JP2006044599 20060221; JP2006236878 20060831
  • 主分类号: G03F7/20
  • IPC分类号: G03F7/20
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要:
Positional information of a movable body (RST) in a Y-axis direction is measured using an interferometer (16y) and an encoder ((24A, 26A 1 ), (24B, 26B 1 )) whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the encoder is performed. Accordingly, by using measurement values of the interferometer, correction information for correcting the measurement values of the encoder whose short-term stability of the measurement values excels the interferometer is obtained. Then, based on the measurement values of the encoder and the correction information, the movable body is driven in the Y-axis direction with good precision.
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