公开(公告)号：EP4145226A2

公开(公告)日：2023-03-08

申请号：EP22202463.0

申请日：2014-10-29

申请人： NIKON CORPORATION

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20 ,  H01L21/687

摘要： A substrate holding device is equipped with a substrate holder (WH) that adsorbs and holds a substrate (W), and a plurality of vertical movement pin units (34 1 , 34 2 , 34 3 ) that each have, at one end, an adsorption section to adsorb a rear surface of the substrate, and are movable relative to the substrate holder (WH) in a state of adsorbing the rear surface of the substrate (W) with the adsorption section. The plurality of vertical movement pin units (34 1 , 34 2 , 34 3 ) each have at least part including the adsorption section that is displaced in at least one direction, by an action of a force received from the adsorbed substrate (W).

公开(公告)号：EP3147710B1

公开(公告)日：2019-04-10

申请号：EP16197278.1

申请日：2007-01-19

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20

公开(公告)号：EP3327507A1

公开(公告)日：2018-05-30

申请号：EP17206968.4

申请日：2007-02-21

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03F7/207 ,  G03F9/00

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70358 ,  G03F7/70641 ,  G03F7/70666 ,  G03F7/70675 ,  G03F7/70733 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70975 ,  G03F9/7026 ,  G03F9/7084 ,  Y10T29/49826

摘要： An exposure apparatus for exposing a substrate with an illumination light via a projection optical system and a liquid comprises a nozzle member (32), an alignment system (AL1), a mask stage system having a first stage (RST), a base member (12) disposed below the projection optical system, a substrate stage system having a second stage (WST) and a third stage (MST) that are disposed on the base member, a measurement system having a plurality of heads arranged for respectively irradiating a plurality of scale members, and a controller configured to control the first and the second drive systems so that, in an exposure operation of the substrate, scanning exposure in which the mask and the substrate are each moved relative to the illumination light is performed.

公开(公告)号：EP3312676A1

公开(公告)日：2018-04-25

申请号：EP17200084.6

申请日：2007-08-31

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7088

摘要： During the drive of a stage (WST), positional information in a movement plane of the stage (WST) is measured by three encoders (Encl, Enc2, and Enc3) that include at least one each of an X encoder and a Y encoder of an encoder system, and a controller switches the encoders used for a measurement of positional information of the stage (WST) in the movement plane from the encoders (Encl, Enc2, and Enc3) to encoders (Enc4, Enc2, and Enc3) so that the position of the stage (WST) in the movement plane is maintained before and after the switching. Therefore, although the switching of the encoders used for controlling the position of the stage is performed, the position of the stage in the movement plane is maintained before and after the switching, and a correct linkage becomes possible.

摘要翻译： 在驱动阶段（WST）期间，通过三个编码器（Encl，Enc2和Enc3）测量载物台（WST）的移动平面中的位置信息，所述三个编码器分别包括X编码器和Y编码器中的至少一个 编码器系统和控制器将用于测量移动平面中的载物台（WST）的位置信息的编码器从编码器（Encl，Enc2和Enc3）切换到编码器（Enc4，Enc2和Enc3），使得 在切换之前和之后维持移动平面中的平台（WST）的位置。 因此，尽管执行用于控制平台位置的编码器的切换，但在切换之前和之后维持移动平面中平台的位置，并且能够进行正确的连接。

公开(公告)号：EP3054353B1

公开(公告)日：2018-04-18

申请号：EP16156879.5

申请日：2010-08-24

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20 ,  G01B11/27 ,  G03F9/00 ,  H01L21/68

CPC分类号： G03F7/70108 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70516 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70975 ,  G03F9/70 ,  G03F9/7046 ,  Y10T29/49004

摘要： An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage (WST1) by irradiating a measurement beam using four heads (60 1 to 60 4 ) installed on the wafer stage (WST1) on a scale plate (21) which covers the movement range of the wafer stage (WST1) except for the area right under a projection optical system (PL). Placement distances (A, B) of the heads (60 1 to 60 4 ) here are each set to be larger than width (a i , b i ) of the opening of the scale plates (21), respectively. This allows the positional information of the wafer stage to be measured, by switching and using the three heads facing the scale plate out of the four heads according to the position of the wafer stage.

公开(公告)号：EP2990872B1

公开(公告)日：2017-12-13

申请号：EP15182331.7

申请日：2007-08-31

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20 ,  G01B11/00 ,  G01B11/30 ,  H01L21/027

CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/70725 ,  G03F7/70975 ,  Y10T29/49002 ,  Y10T29/49105 ,  Y10T29/49826

摘要： A drive device drives a wafer stage in a Y-axis direction based on a measurement value of an encoder (62A) that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale (39Y 1 ) that is measured by the encoder. In this case, the drive device can drive the wafer stage in a predetermined direction based on a measurement value after correction in which a measurement error caused by the flatness of the scale included in the measurement value of the encoder is corrected based on the information on the flatness of the scale. Accordingly, the wafer stage can be driven with high accuracy in a predetermined direction using the encoder, without being affected by the unevenness of the scale.

公开(公告)号：EP2993688B1

公开(公告)日：2017-04-05

申请号：EP15182526.2

申请日：2007-08-31

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20 ,  G01B11/00 ,  G01B11/26 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7088

摘要： During the drive of a stage (WST), positional information in a movement plane of the stage (WST) is measured by three encoders (Enc1 Enc2, and Enc3) that include at least one each of an X encoder and a Y encoder of an encoder system, and a controller switches the encoders used for a measurement of positional information of the stage (WST) in the movement plane from the encoders (Enc1 Enc2, and Enc3) to encoders (Enc4, Enc2, and Enc3) so that the position of the stage (WST) in the movement plane is maintained before and after the switching. Therefore, although the switching of the encoders used for controlling the position of the stage is performed, the position of the stage in the movement plane is maintained before and after the switching, and a correct linkage becomes possible.

摘要翻译： 在舞台（WST）的驱动期间，舞台（WST）的移动平面中的位置信息由包括X编码器和Y编码器中的至少一个的三个编码器（Enc1 Enc2和Enc3）来测量 编码器系统和控制器将用于测量移动平面中的载台（WST）的位置信息的编码器从编码器（Enc1 Enc2和Enc3）切换到编码器（Enc4，Enc2和Enc3），使得位置 在切换之前和之后保持运动平面中的阶段（WST）。 因此，虽然执行用于控制台的位置的编码器的切换，但是在切换之前和之后维持平台在移动平面中的位置，并且可以进行正确的连接。

公开(公告)号：EP2960927B1

公开(公告)日：2016-11-16

申请号：EP15171838.4

申请日：2005-01-27

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70733 ,  Y10T29/49155

摘要： When a transition from a first state where one stage (WST1 (or WST2)) is positioned at a first area directly below projection optical system (PL) to which liquid (Lq) is supplied to a state where the other stage (WST2 (or WST1)) is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.

摘要翻译： 当从第一状态（WST1（或WST2））位于在液体（Lq）被供给的投影光学系统（PL）正下方的第一区域处的转变到另一级（WST2（或） WST1））位于第一区域，同时驱动两个阶段，同时维持两个阶段在X轴方向上靠近在一起的状态。 因此，在投影光学系统与投影光学系统正下方的特定级之间的空间中供给液体的状态下，能够从第一状态向第二状态转变。 因此，可以减少从一侧侧的曝光动作完成到另一侧的曝光动作开始的时间，这允许以高生产量进行处理。 此外，由于液体可以恒定地存在于投影光学系统的像面侧，因此防止了在投影光学系统的像面上的光学部件上产生水痕。

公开(公告)号：EP2990872A3

公开(公告)日：2016-07-06

申请号：EP15182331.7

申请日：2007-08-31

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20 ,  G01B11/00 ,  G01B11/30 ,  H01L21/027

CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/70725 ,  G03F7/70975 ,  Y10T29/49002 ,  Y10T29/49105 ,  Y10T29/49826

摘要： A drive device drives a wafer stage (WST) in a Y-axis direction based on a measurement value of an encoder (62A) that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale (39Y 1 ) that is measured by the encoder. In this case, the drive device can drive the wafer stage in a predetermined direction based on a measurement value after correction in which a measurement error caused by the flatness of the scale included in the measurement value of the encoder is corrected based on the information on the flatness of the scale. Accordingly, the wafer stage can be driven with high accuracy in a predetermined direction using the encoder, without being affected by the unevenness of the scale.

摘要翻译： 的驱动装置的基础上的编码器的测量值的Y轴方向驱动晶片载台（WST）（62A）做了措施在Y轴方向的晶片载台的位置信息，并基于上的平直度的信息 规模（39Y 1）也由编码器进行测量。 在这种情况下，驱动装置可驱动晶片载置台的基础上修正后的测量值，其中由包含在所述编码器的测量值的标尺的平面度引起的测量误差是基于校正的信息上的预定方向 规模的平面度。 因此，晶片台可以在使用编码器的预定方向高精度而不受标尺的不均匀性驱动。

公开(公告)号：EP3038138A1

公开(公告)日：2016-06-29

申请号：EP15196737.9

申请日：2004-01-26

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70766 ,  H01L21/68

摘要： An exposure apparatus that has an illumination optical system configured to illuminate a mask with illumination light and a projection optical system configured to project a pattern image of the mask onto a substrate, and is configured to perform a scanning exposure of the substrate by moving each of the mask and the substrate relative to the illumination light, the apparatus comprising: a first base member arranged above the projection optical system and having a first opening section through which the illumination light is arranged to pass; a first stage system that has a slider, a movable member and a first drive system, the slider being arranged on the first base member, the slider having a second opening section through which the illumination light is arranged to pass and a support member for supporting the mask in the second opening section, the movable member being arranged on the first base member and being provided with the slider inside, the first drive system having a first motor and being configured to move the slider inside the movable member, and the first motor having a movable element provided at the slider and a stator provided at the movable member; a second base member arranged below the projection optical system; a second stage system that has a stage and a second drive system, the stage being arranged on the second base member and having a holder for holding the substrate, the second drive system having a second motor configured to drive the stage, and the second drive system being configured to move the stage on the second based member; and a controller configured to control the first and the second drive systems so that the mask and the substrate are each moved relative to the illumination light in a first direction orthogonal to an optical axis of the projection optical system, during the scanning exposure, wherein the movable member can be moved by a reaction force generated by a movement of the slider by the first drive system.

摘要翻译： 1。一种曝光装置，其具有：照明光学系统，其被构成为利用照明光照射掩模;以及投影光学系统，其将掩模的图案像投影到基板上，并且构成为通过使各个 所述掩模和所述基板相对于所述照明光，所述装置包括：第一基部构件，所述第一基部构件布置在所述投影光学系统上方并且具有第一开口部分，所述照明光穿过所述第一开口部分; 第一平台系统，其具有滑块，可动构件和第一驱动系统，所述滑块设置在所述第一基座构件上，所述滑块具有供所述照明光穿过的第二开口部和用于支撑所述照明光的支撑构件 在所述第二开口部中的所述掩模，所述可动构件配置于所述第一基座构件，在内部具有所述滑块，所述第一驱动系统具有第一电动机，并且构成为使所述滑块在所述可动构件的内部移动，所述第一电动机 具有设置在滑块上的可动元件和设置在可动元件上的定子; 布置在投影光学系统下方的第二基部构件; 具有平台和第二驱动系统的第二平台系统，所述平台布置在所述第二基底构件上并具有用于保持所述衬底的保持器，所述第二驱动系统具有构造成驱动所述平台的第二电动机，并且所述第二驱动器 系统被配置为在第二基础构件上移动舞台; 以及控制器，被配置为控制第一驱动系统和第二驱动系统，使得在扫描曝光期间，掩模和基板各自相对于照明光在与投影光学系统的光轴正交的第一方向上移动，其中， 通过由第一驱动系统使滑块移动而产生的反作用力使可动部件移动。