发明公开
- 专利标题： A COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCESSES THEREOF
- 专利标题（中）： 用聚合物热产酸及其方法组成
-
申请号： EP14729600.8申请日： 2014-05-15
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公开(公告)号： EP2997058A1公开(公告)日： 2016-03-23
- 发明人: WU, Hengpeng , HONG, SungEun , CAO, Yi , YIN, Jian , PAUNESCU, Margareta , THIYAGARAJAN, Muthiah
- 申请人： AZ Electronic Materials (Luxembourg) S.à.r.l.
- 申请人地址： 32-36, Boulevard d`Avranches 1160 Luxembourg LU
- 专利权人： AZ Electronic Materials (Luxembourg) S.à.r.l.
- 当前专利权人： AZ Electronic Materials (Luxembourg) S.à.r.l.
- 当前专利权人地址： 32-36, Boulevard d`Avranches 1160 Luxembourg LU
- 代理机构： Rippel, Hans Christoph
- 优先权： US201313896936 20130517
- 国际公布： WO2014184308 20141120
- 主分类号： C08F220/34
- IPC分类号： C08F220/34 ; C08F226/10 ; C08F8/44 ; C09D133/14 ; C09D139/06 ; G03F7/039 ; H01L21/027
摘要：
The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R
1 to R
5 are independently chosen from the group consisting of H and C
1 -C
6 alkyl; R
6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C
1 -C
8 ) and fluoroalkyl (C
1 -C
8 ) and W is a C
2 -C
6 alkylene spacer.
1 to R
5 are independently chosen from the group consisting of H and C
1 -C
6 alkyl; R
6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C
1 -C
8 ) and fluoroalkyl (C
1 -C
8 ) and W is a C
2 -C
6 alkylene spacer.
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