发明公开
- 专利标题: HIGH CURRENT CYCLOTRON
- 专利标题(中): 高电流循环
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申请号: EP15192905.6申请日: 2015-11-04
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公开(公告)号: EP3024306A1公开(公告)日: 2016-05-25
- 发明人: FORTON, Eric , KLEEVEN, Willem
- 申请人: ION BEAM APPLICATIONS S.A.
- 申请人地址: Chemin du Cyclotron, 3 1348 Louvain-la-Neuve BE
- 专利权人: ION BEAM APPLICATIONS S.A.
- 当前专利权人: ION BEAM APPLICATIONS S.A.
- 当前专利权人地址: Chemin du Cyclotron, 3 1348 Louvain-la-Neuve BE
- 代理机构: Pecher, Nicolas
- 优先权: EP14193792 20141119
- 主分类号: H05H13/00
- IPC分类号: H05H13/00
摘要:
Cyclotron for accelerating charged particles around an axis, comprising an electromagnet with an upper pole and a lower pole, producing a magnetic field in the direction of said axis; a Dee electrode assembly and a counter Dee electrode assembly separated from each other by a gap for accelerating said charged particles and a pair of ion sources (1, 2) located in a central region of the cyclotron. Said ion sources (1, 2) are located at a distance of said axis such that the particles emitted from the first ion source (1) pass between said first (1) and second (2) ion sources after a path of half a turn, and radially outwards of the second ion source (2) after a path of three half-turns, and reciprocally.
公开/授权文献
- EP3024306B1 HIGH CURRENT CYCLOTRON 公开/授权日:2019-08-07
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