发明公开
EP3073322A3 IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND TARGET OBJECT COATING METHOD
审中-公开
AUF BILDVERARBEITUNG BERUHENDES LITHOGRAFIESYSTEM UND ZIELOBJEKTBESCHICHTUNGSVERFAHREN
- 专利标题： IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND TARGET OBJECT COATING METHOD
- 专利标题（中）： AUF BILDVERARBEITUNG BERUHENDES LITHOGRAFIESYSTEM UND ZIELOBJEKTBESCHICHTUNGSVERFAHREN
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申请号： EP16152367.5申请日： 2010-09-29
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公开(公告)号： EP3073322A3公开(公告)日： 2017-03-01
- 发明人: KWON, Sung Hoon , CHUNG, Sueun , LEE, Seungah , JANG, Jisung , HAN, Sangkwon
- 申请人： SNU R&DB Foundation
- 申请人地址： San 56-1 Sillim-dong Gwanak-gu, Seoul 151-742 KR
- 专利权人： SNU R&DB Foundation
- 当前专利权人： SNU R&DB Foundation
- 当前专利权人地址： San 56-1 Sillim-dong Gwanak-gu, Seoul 151-742 KR
- 代理机构： Winter, Brandl, Fürniss, Hübner, Röss, Kaiser, Polte - Partnerschaft mbB
- 优先权： KR20090093027 20090930; KR20100005094 20100120
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027 ; H01L23/00 ; H01L33/44 ; B29C35/08 ; H01L21/66 ; G03F9/00 ; H01L21/56 ; C23C16/52 ; G03F7/16 ; H01L23/31 ; H01L23/433
摘要：
A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
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