发明公开
- 专利标题： CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
- 专利标题（中）： 清洁剂清除表面残留物
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申请号： EP14867771.9申请日： 2014-12-03
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公开(公告)号： EP3077129A1公开(公告)日： 2016-10-12
- 发明人: TAKAHASHI, Tomonori , DU, Bing , WOJTCZAK, William A. , DORY, Thomas , KNEER, Emil A.
- 申请人： FujiFilm Electronic Materials USA, Inc.
- 申请人地址： 80 Circuit Drive North Kingstown, RI 02852 US
- 专利权人： FujiFilm Electronic Materials USA, Inc.
- 当前专利权人： FujiFilm Electronic Materials USA, Inc.
- 当前专利权人地址： 80 Circuit Drive North Kingstown, RI 02852 US
- 代理机构： Burda, Martin Robert
- 优先权： US201361912697P 20131206; US201461936999P 20140207
- 国际公布： WO2015084921 20150611
- 主分类号： B08B3/04
- IPC分类号： B08B3/04 ; C11D7/60
摘要：
This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
公开/授权文献
- EP3077129B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES 公开/授权日：2020-11-11
信息查询
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