发明公开
EP3093711A2 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
审中-公开
曝光装置,曝光方法和手段用于制造器件
- 专利标题: EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
- 专利标题(中): 曝光装置,曝光方法和手段用于制造器件
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申请号: EP16155447.2申请日: 2004-09-29
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公开(公告)号: EP3093711A2公开(公告)日: 2016-11-16
- 发明人: Nishinaga, Hisashi , Hikima, Ikuo , Toyoda, Mitsunori , Mizuno, Yasushi , Kita, Naonori , Tanitsu, Osamu
- 申请人: Nikon Corporation
- 申请人地址: 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 JP
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 JP
- 代理机构: Hoffmann Eitle
- 优先权: JP2003338420 20030929; JP2003344938 20031002; JP2004042931 20040219
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
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