公开(公告)号：EP3093710A3

公开(公告)日：2016-12-21

申请号：EP16155446.4

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

公开(公告)号：EP2320273A1

公开(公告)日：2011-05-11

申请号：EP10196147.2

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

公开(公告)号：EP3093711A3

公开(公告)日：2017-05-24

申请号：EP16155447.2

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

摘要翻译： 通过投影光学系统（PL）通过液体（LQ）的曝光束的一部分进入透光部分（44），而不通过气体进入光学部件（41）并被聚焦。 即使投影光学系统的数值孔径增加，曝光装置从投影光学系统接收曝光光也可进行各种测量。

公开(公告)号：EP3093711A2

公开(公告)日：2016-11-16

申请号：EP16155447.2

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

公开(公告)号：EP2837969B1

公开(公告)日：2016-04-20

申请号：EP14182626.3

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

公开(公告)号：EP3093710B1

公开(公告)日：2018-05-09

申请号：EP16155446.4

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

公开(公告)号：EP3301503A1

公开(公告)日：2018-04-04

申请号：EP17185703.0

申请日：2008-03-13

申请人： Nikon Corporation

发明人： Kita, Naonori

IPC分类号： G02B27/09 ,  G03F7/20 ,  G02B5/04

CPC分类号： G02B27/0966 ,  G02B27/0927 ,  G03F7/70075

摘要： An optical integrator system comprises a first optical integrator (110) having a plurality of first wavefront dividing elements (111) two-dimensionally juxtaposed, and a second optical integrator (120) having a plurality of second wavefront dividing elements (121) two-dimensionally juxtaposed. Each of the first wavefront dividing elements is so constructed that rays obliquely incident to a center on an optical axis of an entrance surface are emitted in parallel with the optical axis. Each of the second wavefront dividing elements is also so constructed that rays obliquely incident to a center on an optical axis of an entrance surface are emitted in parallel with the optical axis. The system satisfies the condition of P2/(2×tanθ)

摘要翻译： 一种光学积分器系统包括具有二维并置的多个第一波前分割元件（111）的第一光学积分器（110）和具有二维地多个第二波前分割元件（121）的第二光学积分器（120） 并列。 每个第一波前分割元件被构造为使得斜向入射到入射面的光轴上的中心的光线平行于光轴发射。 每个第二波前分割元件也构造成斜向入射到入射面的光轴上的中心的光线平行于光轴发射。 系统满足P2 /（2×tanθ）

公开(公告)号：EP2837969A1

公开(公告)日：2015-02-18

申请号：EP14182626.3

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

摘要翻译： 通过投影光学系统（PL）通过液体（LQ）的曝光束的一部分进入透光部分（44），而不通过气体进入光学部件（41）并被聚焦。 即使投影光学系统的数值孔径增加，曝光装置从投影光学系统接收曝光光也可进行各种测量。

公开(公告)号：EP3093710A2

公开(公告)日：2016-11-16

申请号：EP16155446.4

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

摘要翻译： 通过投影光学系统（PL）通过液体（LQ）的曝光光束的一部分进入光透射部分（44），不经过气体进入光学部件（41）并聚焦。 即使投影光学系统的数值孔径增加，曝光设备也接收来自投影光学系统的曝光光线以执行各种测量。

公开(公告)号：EP2312395B1

公开(公告)日：2015-05-13

申请号：EP10196145.6

申请日：2004-09-29

申请人： Nikon Corporation

发明人： Nishinaga, Hisashi ,  Hikima, Ikuo ,  Toyoda, Mitsunori ,  Mizuno, Yasushi ,  Kita, Naonori ,  Tanitsu, Osamu

IPC分类号： G03F7/20

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.