发明公开
EP3139409A1 RADIATION DETECTOR, METHOD OF MANUFACTURING A RADIATION DETECTOR AND USE OF THE DETECTOR FOR MEASURING RADIATION
审中-公开
辐射探测器,制造辐射探测器和使用检测仪辐射测量方法
- 专利标题: RADIATION DETECTOR, METHOD OF MANUFACTURING A RADIATION DETECTOR AND USE OF THE DETECTOR FOR MEASURING RADIATION
- 专利标题(中): 辐射探测器,制造辐射探测器和使用检测仪辐射测量方法
-
申请号: EP16162571.0申请日: 2008-12-03
-
公开(公告)号: EP3139409A1公开(公告)日: 2017-03-08
- 发明人: GARCIA, Francisco , ORAVA, Risto , LOZANO, Manuel , PELLEGRINI, Giulio
- 申请人: Rakkatec Oy
- 申请人地址: Arkadiankatu 23 G 00100 Helsinki FI
- 专利权人: Rakkatec Oy
- 当前专利权人: Rakkatec Oy
- 当前专利权人地址: Arkadiankatu 23 G 00100 Helsinki FI
- 代理机构: Espatent Oy
- 优先权: FI20070939 20071204
- 主分类号: H01L27/146
- IPC分类号: H01L27/146 ; H01L27/144 ; H01L31/0352
摘要:
A detector for detecting signals derived from charged particles (1) incident thereon, the charged particles consisting of at least one of protons, deuterons, tritons, and α-particles, and for distinguishing signals caused from the charged particles interacting with the detector from background radiation containing neutron and gamma particles, the detector comprising: a silicon wafer (4) having an entrance opening etched through a low-resistivity layer of silicon; a sensitive layer of high-resistivity silicon (3) for converting the radiation particles into detectable charges; a passivation layer (6) between the low-resistivity layer and the sensitive layer of high-resistivity silicon; a plurality of electrodes (2) built in the form of vertical channels for collecting the charges etched into the sensitive layer of high-resistivity silicon; and read-out electronics for generating signals from the collected charges, wherein the detector is constructed to take in the charged particles to be detected directly through the passivation layer and wherein the thickness of the sensitive layer of high-resistivity silicon has been selected as a function of the mean free path of the charged particles to be detected.
信息查询
IPC分类: