- 专利标题: MULTI-LASER SYSTEM AND METHOD FOR CUTTING AND POST-CUT PROCESSING HARD DIELECTRIC MATERIALS
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申请号: EP15836681申请日: 2015-08-28
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公开(公告)号: EP3186030A4公开(公告)日: 2018-07-04
- 发明人: SERCEL JEFFREY P , MENDES MARCO , SARRAFI ROUZBEH , SCHOENLY JOSHUA , SONG XIANGYANG , HANNON MATHEW , SOKOL MIROSLAW
- 申请人: IPG PHOTONICS CORP
- 专利权人: IPG PHOTONICS CORP
- 当前专利权人: IPG PHOTONICS CORP
- 优先权: US201462043363 2014-08-28
- 主分类号: B23K26/38
- IPC分类号: B23K26/38 ; B23K26/06 ; B23K26/0622 ; B23K26/08 ; B23K26/082 ; B23K26/361 ; B23K26/402
摘要:
Laser processing of hard dielectric materials may include cutting a part from a hard dielectric material using a continuous wave laser operating in a quasi-continuous wave (QCW) mode to emit consecutive laser light pulses in a wavelength range of about 1060 nm to 1070 nm. Cutting using a QCW laser may be performed with a lower duty cycle (e.g., between about 1% and 15%) and in an inert gas atmosphere such as nitrogen, argon or helium. Laser processing of hard dielectric materials may further include post-cut processing the cut edges of the part cut from the dielectric material, for example, by beveling and/or polishing the edges to reduce edge defects. The post-cut processing may be performed using a laser beam with different laser parameters than the beam used for cutting, for example, by using a shorter wavelength (e.g., 193 nm excimer laser) and/or a shorter pulse width (e.g., picosecond laser).
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