- 专利标题： POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, LAMINATE, PATTERNING PROCESS, AND COMPOUND
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申请号： EP17000111.9申请日： 2017-01-23
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公开(公告)号： EP3203319B1公开(公告)日： 2018-06-20
- 发明人: Domon, Daisuke , Hasegawa, Koji , Masunaga, Keiichi , Kotake, Masaaki
- 申请人： Shin-Etsu Chemical Co., Ltd.
- 申请人地址： 6-1, Ohtemachi 2-chome Chiyoda-ku, Tokyo 100-0004 JP
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： 6-1, Ohtemachi 2-chome Chiyoda-ku, Tokyo 100-0004 JP
- 代理机构： Wibbelmann, Jobst
- 优先权： JP2016011349 20160125
- 主分类号： G03F7/038
- IPC分类号： G03F7/038
摘要：
The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.
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