An exhaust gas purification device of the present invention is provided with: a substrate 10 of wall flow structure having an inlet cell 12, an outlet cell 14 and a porous partition wall 16; an upstream catalyst layer 20, provided inside the partition wall 16 and disposed in an upstream portion of the substrate 10 including an exhaust gas inflow end section; and a downstream catalyst layer 30, provided inside the partition wall 16 and disposed in a downstream portion of the substrate 10 including an exhaust gas outflow end section. The upstream catalyst layer 20 and the downstream catalyst layer 30 each contain a carrier and at least one noble metal from among Pt, Pd and Rh, supported on the carrier. The noble metal in the upstream catalyst layer 20 and the noble metal in the downstream catalyst layer 30 are different from each other.