发明公开
- 专利标题: SUBTHRESHOLD METAL OXIDE SEMICONDUCTOR FOR LARGE RESISTANCE
- 专利标题(中): 亚阈值金属氧化物半导体用于大电阻
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申请号: EP15797226.6申请日: 2015-11-06
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公开(公告)号: EP3231088A1公开(公告)日: 2017-10-18
- 发明人: TAGHIVAND, Mazhareddin , RAJAVI, Yashar , KHALILI, Alireza
- 申请人: Qualcomm Incorporated
- 申请人地址: 5775 Morehouse Drive San Diego, CA 92121-1714 US
- 专利权人: Qualcomm Incorporated
- 当前专利权人: Qualcomm Incorporated
- 当前专利权人地址: 5775 Morehouse Drive San Diego, CA 92121-1714 US
- 代理机构: Schmidbauer, Andreas Konrad
- 优先权: US201462089927P 20141210; US201514642309 20150309
- 国际公布: WO2016093991 20160616
- 主分类号: H03H11/24
- IPC分类号: H03H11/24
摘要:
Certain aspects of the present disclosure generally relate to generating a large electrical resistance. One example circuit generally includes a first transistor having a gate, a source connected with a first node of the circuit, and a drain connected with a second node of the circuit. The circuit may also include a voltage-limiting device connected between the gate and the source of the first transistor, wherein the device, if forward biased, is configured to limit a gate-to-source voltage of the first transistor such that the first transistor operates in a sub-threshold region. The circuit may further include a second transistor configured to bias the voltage-limiting device with a current, wherein a drain of the second transistor is connected with the gate of the first transistor, a gate of the second transistor is connected with the first node, and a source of the second transistor is connected with an electric potential.
公开/授权文献
- EP3231088B1 SUBTHRESHOLD METAL OXIDE SEMICONDUCTOR FOR LARGE RESISTANCE 公开/授权日:2020-07-22
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