发明公开
- 专利标题: DEPOSITION PROCESS
- 专利标题(中): 沉积过程
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申请号: EP16704900.6申请日: 2016-02-10
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公开(公告)号: EP3259237A1公开(公告)日: 2017-12-27
- 发明人: RAISBECK, Deborah , HURST, Simon James , PARKIN, Ivan P. , CARMALT, Claire J. , MANZI, Joe, A.
- 申请人: Pilkington Group Limited , University College London
- 申请人地址: European Technical Centre Hall Lane Lathom Nr. Ormskirk, Lancashire L40 5UF GB
- 专利权人: Pilkington Group Limited,University College London
- 当前专利权人: Pilkington Group Limited,University College London
- 当前专利权人地址: European Technical Centre Hall Lane Lathom Nr. Ormskirk, Lancashire L40 5UF GB
- 代理机构: Knowles, James Atherton
- 优先权: GB201502574 20150216
- 国际公布: WO2016132100 20160825
- 主分类号: C03C17/245
- IPC分类号: C03C17/245 ; C23C16/40 ; C23C16/448 ; C23C14/18
摘要:
A process for depositing an inorganic material on a substrate, the process comprising, providing a substrate having a surface, providing a precursor mixture comprising a metal sulfonate, and delivering the precursor mixture to the surface of the substrate, wherein the surface of the substrate is at a substrate temperature of above 450 °C and is sufficient to effect decomposition of the metal sulfonate. The inorganic material may include a metal or a metal oxide. The preferred metal sulfonate is metal triflate.
公开/授权文献
- EP3259237B1 DEPOSITION PROCESS 公开/授权日:2024-03-27
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