- 专利标题: COUNTERFEIT PREVENTION STRUCTURE AND MANUFACTURING METHOD THEREFOR
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申请号: EP17209888.1申请日: 2013-11-14
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公开(公告)号: EP3326832A2公开(公告)日: 2018-05-30
- 发明人: YASHIKI, Kazuhiro
- 申请人: Toppan Printing Co., Ltd.
- 申请人地址: 5-1, Taito 1-chome Taito-ku, Tokyo 110-0016 JP
- 专利权人: Toppan Printing Co., Ltd.
- 当前专利权人: Toppan Printing Co., Ltd.
- 当前专利权人地址: 5-1, Taito 1-chome Taito-ku, Tokyo 110-0016 JP
- 代理机构: Cabinet Plasseraud
- 优先权: JP2012253291 20121119
- 主分类号: B42D25/324
- IPC分类号: B42D25/324 ; B42D25/328 ; B42D25/30 ; B42D25/36 ; B42D25/373 ; B42D25/40 ; B42D25/425 ; B42D25/445 ; G02B5/08 ; G02B5/18
摘要:
A counterfeit prevention structure (10) includes a fine-relief-formation layer (11) which is provided with a first area (13) having an optical element that includes a relief structure whose depth-to-width ratio that is a ratio of a depth relative to a width is not less than a first value, and a second area (14) having an optical element that includes a relief structure whose depth-to-width ratio is less than the first value. The counterfeit prevention structure (10) further includes a reflective layer (12) that is arranged on the relief structure included in the area having the lower light transmittance among the first and second areas (13;14).
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