- 专利标题: RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND METAL-CONTAINING RESIN AND METHOD FOR MANUFACTURING SAME
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申请号: EP17887183.6申请日: 2017-11-27
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公开(公告)号: EP3564751A1公开(公告)日: 2019-11-06
- 发明人: ASANO Yusuke , NAKAGAWA Hisashi , MINEGISHI Shinya
- 申请人: JSR Corporation
- 申请人地址: 9-2, Higashi-shinbashi 1-chome Minato-ku Tokyo 105-8640 JP
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: 9-2, Higashi-shinbashi 1-chome Minato-ku Tokyo 105-8640 JP
- 代理机构: TBK
- 优先权: JP2016256898 20161228
- 国际公布: WO2018123388 20180705
- 主分类号: G03F7/038
- IPC分类号: G03F7/038 ; C08F12/14 ; C08G79/12 ; G03F7/004 ; G03F7/20 ; G03F7/32 ; G03F7/039
摘要:
A radiation-sensitive composition is to be used in exposure with an extreme ultraviolet ray or an electron beam, and includes a first polymer and a solvent, wherein the first polymer includes a first structural unit including: at least one metal atom; and at least one carbon atom that each bonds to the metal atom by a chemical bond and does not constitute an unsaturated bond, and at least one chemical bond is a covalent bond. Every chemical bond is preferably a covalent bond. The metal atom is preferably tin, germanium, lead or a combination thereof.
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