MULTI-ELECTRON-BEAM IMAGING APPARTUS WITH IMPROVED PERORMANCE
摘要:
An electron beam imaging apparatus comprising:
- A specimen holder, for holding a specimen;
- An electron source, for producing a precursor electron beam;
- An aperture plate comprising an array of apertures, for producing an array of electron beams from said precursor electron beam;
- An electron beam column, for directing said array of electron beams onto said specimen,
wherein said electron beam column is configured to have a length L less than 300 mm.
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