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    SYSTEMS AND METHODS FOR PERFORMING SAMPLE LIFT-OUT FOR HIGHLY REACTIVE MATERIALS
    1.
    发明公开
    SYSTEMS AND METHODS FOR PERFORMING SAMPLE LIFT-OUT FOR HIGHLY REACTIVE MATERIALS 审中-公开

    公开(公告)号：EP4425144A3

    公开(公告)日：2024-11-13

    申请号：EP24188812.2

    申请日：2022-12-29

    申请人： FEI Company

    发明人： STOKES, Adam ,  BUGGE, Cliff ,  VAN LEER, Brandon ,  BROGDEN, Valerie ,  JIAO, Chengge ,  LI, Letian ,  DONNET, David

    IPC分类号： G01N1/28 ,  G01N1/32

    摘要： Methods and systems for performing sample lift-out and protective cap placement for highly reactive materials within charged particle microscopy systems are disclosed herein. Methods include preparing a nesting void in a support structure, translating at least a portion of a sample into the nesting void, and milling material from a region of the support structure that defines the nesting void. The material from the region of the support structure is milled such that at least some of the removed material redeposits to form an attachment bond between the sample and a remaining portion of the support structure. In various embodiments, the sample can then be investigated using one or more of serial sectioning tomography on the sample, enhanced insertable backscatter detector (CBS) analysis on the sample, and electron backscatter diffraction (EBSD) analysis on the sample.

    MICROSCOPE DEVICE
    3.
    发明公开
    MICROSCOPE DEVICE 审中-实审

    公开(公告)号：EP4354118A3

    公开(公告)日：2024-06-26

    申请号：EP23204576.5

    申请日：2012-09-28

    申请人： FEI COMPANY ,  Miltenyi Biotec B.V. & Co. KG

    发明人： UHL, Rainer ,  SCHROPP, Martin

    IPC分类号： G02B21/00 ,  G01N21/63

    CPC分类号： G01N21/6458 ,  G02B21/14 ,  G02B21/367 ,  G02B27/58 ,  G02B21/0032

    摘要： A microscope has an objective, a light source illuminating a sample over an illumination beam path, an arrangement producing a flat illumination pattern which is structured in both spatial directions on the sample, a surface detector detecting light coming over one picture beam path, an arrangement shifting the illumination pattern on the sample in one displacement direction, and a control unit taking one picture at a time of the light which was detected by the detector as phase picture in different positions of the pattern along the displacement direction and to computationally reconstruct from these phase pictures an overall picture of the illuminated sample region. The displacement direction is oblique to the main axes of symmetry of the illumination pattern and depending on the illumination pattern is chosen such that the number of phase pictures which is necessary for the picture reconstruction corresponds to the theoretically minimally required value.

    METHOD OF EVALUATING A SAMPLE USING CHARGED PARTICLE MICROSCOPY
    5.
    发明公开
    METHOD OF EVALUATING A SAMPLE USING CHARGED PARTICLE MICROSCOPY 审中-公开

    公开(公告)号：EP4382897A1

    公开(公告)日：2024-06-12

    申请号：EP22211536.2

    申请日：2022-12-05

    申请人： FEI COMPANY

    发明人： Nemecek, Daniel ,  Unger, Sebastian ,  Phelippeau, Harold ,  Bressers, Thijs M. J. ,  Milian, Steven ,  Kairawicz, Laure

    IPC分类号： G01N23/2251

    CPC分类号： G01N23/2251

    摘要： The invention relates to a method of evaluating a sample using charged particle microscopy, comprising the steps of a sample containing primary particles of interest. The method further comprises the steps of imaging said sample using said charged particle microscope for obtaining at least one image of said primary particles; and determining a concentration of said primary particles using said at least one image. As defined herein, the sample further contains secondary particles that are independent from said primary particles, and which are are present in said at least one image. The method is characterized by the steps of providing a known concentration of said secondary particles and using said known concentration of said secondary particles in said step of determining said concentration of said primary particles.

    SIMPLE SPHERICAL ABERRATION CORRECTOR FOR SEM
    6.
    发明公开
    SIMPLE SPHERICAL ABERRATION CORRECTOR FOR SEM 审中-实审

    公开(公告)号：EP4322198A3

    公开(公告)日：2024-06-12

    申请号：EP23190106.7

    申请日：2023-08-07

    申请人： FEI Company

    发明人： MOHAMMADI-GHEIDARI, Ali ,  HENSTRA, Alexander

    IPC分类号： H01J37/153

    CPC分类号： H01J37/153 ,  H01J2237/153420130101 ,  H01J2237/153220130101 ,  H01J2237/1220130101 ,  H01J2237/2820130101 ,  H01J37/12

    摘要： Optical corrector modules for charged particle columns which comprise split multipoles, according to the present invention include at least one split multipole composed of two multipoles separated by a distance less than 10mm, 1m, 100µm, and/or 10µm. Each of the individual multipoles may comprise at least two electrodes positioned to partially define a beam path through the multipole. According to the present invention, each of the electrodes comprises: a first surface that faces upstream of a charged particle beam when used in the charged particle column; and a second surface that faces downstream of the charged particle beam when used in the charged particle column, wherein the thickness between the first surface and the second surface for each of the electrodes is less than 10 mm, 5mm, and/or 3mm. Within the scope of the disclosure, the split multipoles may be electrostatic and may correspond to hexapoles.

    A METHOD OF AUTOMATED DATA ACQUISITION FOR A TRANSMISSION ELECTRON MICROSCOPE
    7.
    发明公开
    A METHOD OF AUTOMATED DATA ACQUISITION FOR A TRANSMISSION ELECTRON MICROSCOPE 审中-公开

    公开(公告)号：EP4345447A1

    公开(公告)日：2024-04-03

    申请号：EP22199178.9

    申请日：2022-09-30

    申请人： FEI COMPANY

    发明人： DENG, Yuchen ,  KOHR, Holger ,  VAN KNIPPENBERG, Bart ,  TIEMEIJER, Peter ,  YU, Lingbo

    IPC分类号： G01N23/2251 ,  H01J37/26

    摘要： A method of automated data acquisition for a transmission electron microscope, the method comprising: obtaining a reference image of a sample at a first magnification; for each of a first plurality of target locations identified in the reference image: steering an electron beam of the transmission electron microscope to the target location, obtaining a calibration image of the sample at a second magnification greater than the first magnification, and using image processing techniques to identify an apparent shift between an expected position of the target location in the calibration image and an observed position of the target location in the calibration image, training a non-linear model using the first plurality of target locations and the corresponding apparent shifts; based on the non-linear model, calculating a calibrated target location for a next target location; steering the electron beam to the calibrated target location and obtaining an image at a third magnification greater than the first magnification.

    CHARGED PARTICLE OPTICS COMPONENTS AND THEIR FABRICATION
    8.
    发明公开
    CHARGED PARTICLE OPTICS COMPONENTS AND THEIR FABRICATION 审中-公开

    公开(公告)号：EP4322196A2

    公开(公告)日：2024-02-14

    申请号：EP23190282.6

    申请日：2023-08-08

    申请人： FEI COMPANY

    发明人： MOHAMMADI-GHEIDARI, Ali ,  HENSTRA, Alexander ,  MELE, Luigi

    IPC分类号： H01J37/147 ,  H01J37/153 ,  H01J1/46 ,  H01J9/14 ,  H01J37/28

    摘要： The present invention is directed to an electrode component 200 with at least two electrodes 202,204 or a multipole component as generally known in the art. Each of the electrodes can be provided with a beam neighboring section or end section forming the free electrodes. This section is the section exposed to high voltages, i.e. more than 10 KV, and is intended to nevertheless work very reliable and precise with respect to the guidance and/or controlling of a beam of a charged particle beam in a microscope or lithographic apparatus. This neighboring section are positioned in the vicinity or close to a charged particle beam or even facing it. This bears the preferred advantage that high voltages can be generated by the electrodes or to the electrode component and they can withstand those high voltages. This assists in a better guidance and/or controlling of the charged beam, such as for compensating aberration etc. The beam neighboring section can have a surface configured to face the beam. This neighboring section or surface are fabricated with absolute dimensional tolerances less than a desired maximum absolute dimensional tolerance wherein the desired maximum absolute dimensional tolerance is based at least on a maximum voltage to be applied to the electrode. With such a precisely fabricated surface, a more precise and/or efficient field can be generated being able to control the charged particle beam more precisely and efficiently.

    AUTOMATIC SELECTION OF STRUCTURES-OF-INTEREST FOR LAMELLA SAMPLE PREPARATION
    10.
    发明公开
    AUTOMATIC SELECTION OF STRUCTURES-OF-INTEREST FOR LAMELLA SAMPLE PREPARATION 审中-公开

    公开(公告)号：EP4286825A1

    公开(公告)日：2023-12-06

    申请号：EP23176964.7

    申请日：2023-06-02

    申请人： FEI COMPANY

    发明人： Kriz, Radim ,  Dolník, Matej ,  Vrábel, Marko

    IPC分类号： G01N1/28 ,  G06T7/11 ,  G06V20/69 ,  H01J37/31

    摘要： Disclosed herein are scientific instrument support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a support apparatus is provided for a charged particle microscope. The support apparatus is configured to apply automated image processing to an image representing a lamella sample to segment the image into a plurality of segmented classes. The support apparatus is also configured to identify, based on the plurality of segmented classes, a subset of candidate structures-of-interest in the lamella sample and to select, from the subset of candidate structures-of-interest in the lamella sample, a selected structure-of-interest for milling. The support apparatus is also configured to set, based on the selected structure-of-interest for milling, at least one milling parameter for the scientific instrument. An automated method performed via a computing device for providing such scientific instrument support is also provided.