发明公开
- 专利标题： FEEDSTOCK FOR FORMING THIN FILMS, THIN FILM PRODUCTION METHOD AND NOVEL COMPOUND
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申请号： EP18823105.4申请日： 2018-05-17
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公开(公告)号： EP3647460A1公开(公告)日： 2020-05-06
- 发明人: NISHIDA, Akihiro , OKADA, Nana , OE, Yoshiki
- 申请人： Adeka Corporation
- 申请人地址： 2-35, Higashiogu 7-chome Arakawa-ku Tokyo 116-8554 JP
- 专利权人： Adeka Corporation
- 当前专利权人： Adeka Corporation
- 当前专利权人地址： 2-35, Higashiogu 7-chome Arakawa-ku Tokyo 116-8554 JP
- 代理机构： Kador & Partner PartG mbB
- 优先权： JP2017127401 20170629
- 国际公布： WO2019003695 20190103
- 主分类号： C23C16/32
- IPC分类号： C23C16/32 ; C07F17/00 ; C23C16/18 ; H01L21/316 ; C07F7/28
摘要：
The present invention provides a raw material for thin film formation which has excellent safety, transportability, and productivity and can be used for a CVD method, a method for manufacturing a thin film using the raw material, and a novel compound used as a raw material for thin film formation.
In order to achieve the above object, the present invention provides a raw material for thin film formation containing a compound represented by the following General Formula (1), a method for manufacturing a thin film using the raw material, and a novel compound represented by General Formula (2) in this specification:
wherein, X represents a halogen atom, and R represents a primary alkyl group or secondary butyl group having 1 to 5 carbon atoms.
In order to achieve the above object, the present invention provides a raw material for thin film formation containing a compound represented by the following General Formula (1), a method for manufacturing a thin film using the raw material, and a novel compound represented by General Formula (2) in this specification:
wherein, X represents a halogen atom, and R represents a primary alkyl group or secondary butyl group having 1 to 5 carbon atoms.
公开/授权文献
- EP3647460B1 THIN FILM PRODUCTION METHOD AND NOVEL COMPOUND 公开/授权日：2023-04-12
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