- 专利标题: METHOD FOR EVALUATING SIC SUBSTRATE WITH INCLINED SUPPORT BASE
-
申请号: EP20200972.6申请日: 2017-04-27
-
公开(公告)号: EP3783637A1公开(公告)日: 2021-02-24
- 发明人: KANEKO, Tadaaki , ASHIDA, Koji
- 申请人: Kwansei Gakuin Educational Foundation
- 申请人地址: JP Nishinomiya-shi, Hyogo 662-8501 1-155, Uegahara-ichiban-cho
- 代理机构: TBK
- 优先权: JP2016089094 20160427
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; H01J37/26
摘要:
A reference sample (41) has a step/terrace structure made of monocrystalline SiC and a surface of each terrace has first or second stack orientation. In the reference sample (41), contrast as difference in lightness and darkness between an image of a terrace with a surface directly under which the first stack orientation lies and an image of a terrace with a surface directly under which the second stack orientation lies changes according to an incident electron angle which is an angle that an electron beam emitted from a scanning electron microscope forms with a perpendicular to the terrace surface. Even when a SiC substrate has an off angle (e.g., from 1° to 8°), using an inclined support base (20a) capable of correcting the off angle enables sharp contrast that reflects difference between the first and second stack orientations directly under the surface to be obtained irrespective of the off angle.
信息查询