- 专利标题： SUBSTRATE TABLE AND METHOD OF HANDLING A SUBSTRATE
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申请号： EP20158702.9申请日： 2020-02-21
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公开(公告)号： EP3869272A1公开(公告)日： 2021-08-25
- 发明人: TEN KATE, Nicolaas , WINKELS, Koen, Gerhardus , HABETS, Michel, Ben, Isel
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL 5500 AH Veldhoven P.O. Box 324
- 代理机构： ASML Netherlands B.V.
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/687
摘要：
The disclosure relates to substrate tables for lithography and methods of handling a substrate. In one arrangement, a substrate table comprises one or more membranes. An actuation system deforms each membrane to change a height of a portion of the membrane. In another arrangement, a substrate table comprises one or more membranes and a clamping system for clamping a substrate to the substrate table, wherein the clamping deforms each membrane by pressing the substrate against the membrane.
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