公开(公告)号：EP3510446A1

公开(公告)日：2019-07-17

申请号：EP17755209.8

申请日：2017-08-28

申请人： ASML Netherlands B.V.

发明人： VAN DEN EIJNDEN, Pepijn ,  ROPS, Cornelius Maria ,  POLET, Theodorus Wilhelmus ,  KEUKENS, Floor Lodewijk ,  TANASA, Gheorghe ,  CORTIE, Rogier Hendrikus Magdalena ,  CUYPERS, Koen ,  BUDDENBERG, Harold Sebastiaan ,  GATTOBIGIO, Giovanni Luca ,  VAN VLIET, Evert ,  TEN KATE, Nicolaas ,  FRENCKEN, Mark Johannes Hermanus ,  VAN ERVE, Jantien Laura ,  TEUNISSEN, Marcel Maria Cornelius Franciscus

IPC分类号： G03F7/20

公开(公告)号：EP2810127A1

公开(公告)日：2014-12-10

申请号：EP13700401.6

申请日：2013-01-17

申请人： ASML Netherlands B.V.

发明人： LAFARRE, Raymond ,  DONDERS, Sjoerd ,  TEN KATE, Nicolaas ,  DZIOMKINA, Nina ,  KARADE, Yogesh ,  RODENBURG, Elisabeth

IPC分类号： G03F7/20

摘要： A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body (400) and a plurality of burls provided on the main body and having end surfaces to support a substrate. The burls each comprise a lower portion (406a) protruding from the main body and an upper portion (406b) above the lower portion. The lower portions are a different material than the upper portions, the upper portions comprise diamond-like carbon, and the upper portions are separated from each other.

摘要翻译： 用于光刻设备的物体保持器具有具有表面的主体。 在薄膜叠层的表面或孔中形成有用于支撑物体的多个毛刺。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的另一种方法的修复。

公开(公告)号：EP1872175A1

公开(公告)日：2008-01-02

申请号：EP06733009.2

申请日：2006-04-19

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： KHMELICHEK, Aleksandr ,  SEWELL, Harry ,  MARKOYA, Louis, John ,  LOOPSTRA, Erik, Roelof ,  TEN KATE, Nicolaas

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612) that are configured to be at different distances from a surface of the substrate during an exposure operation.

公开(公告)号：EP4111261A1

公开(公告)日：2023-01-04

申请号：EP21701136.0

申请日：2021-01-25

申请人： ASML Netherlands B.V.

发明人： BALTIS, Coen, Hubertus, Matheus ,  TEN KATE, Nicolaas ,  VERMEULEN, Marcus, Martinus, Petrus, Adrianus ,  TROMP, Siegfried, Alexander ,  VAN DEN BERKMORTEL, Frank, Pieter, Albert ,  ROSET, Niek, Jacobus, Johannes ,  KRAMER, Gijs ,  BRANTJES, Nicolaas, Petrus, Marcus ,  FONTEYN, Michiel, Theodorus, Jacobus

IPC分类号： G03F7/20

公开(公告)号：EP4062233A1

公开(公告)日：2022-09-28

申请号：EP20790264.4

申请日：2020-10-12

申请人： ASML Netherlands B.V.

发明人： HUANG, Yang-Shan ,  TEN KATE, Nicolaas

IPC分类号： G03F7/20

公开(公告)号：EP2810127B1

公开(公告)日：2020-03-04

申请号：EP13700401.6

申请日：2013-01-17

申请人： ASML Netherlands B.V.

发明人： LAFARRE, Raymond ,  DONDERS, Sjoerd ,  TEN KATE, Nicolaas ,  DZIOMKINA, Nina ,  KARADE, Yogesh ,  RODENBURG, Elisabeth

IPC分类号： G03F7/20

公开(公告)号：EP2810128A2

公开(公告)日：2014-12-10

申请号：EP13700893.4

申请日：2013-01-17

申请人： ASML Netherlands B.V.

发明人： LAFARRE, Raymond ,  DONDERS, Sjoerd ,  TEN KATE, Nicolaas ,  DZIOMKINA, Nina ,  KARADE, Yogesh ,  RODENBURG, Elisabeth

IPC分类号： G03F7/20

CPC分类号： B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

摘要： An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

摘要翻译： 用于光刻设备的物体保持器具有具有表面的主体。 在薄膜叠层的表面或孔中形成有用于支撑物体的多个毛刺。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损伤的隆起的另一种方法的修复。

公开(公告)号：EP4073589A1

公开(公告)日：2022-10-19

申请号：EP20808421.0

申请日：2020-11-20

申请人： ASML Netherlands B.V.

发明人： STEUR, Michael, Marinus, Anna ,  TEN KATE, Nicolaas ,  TROMP, Siegfried, Alexander ,  WINKELS, Koen, Gerhardus ,  DE GROOT, Antonius, Franciscus, Johannes

IPC分类号： G03F7/20 ,  H01L21/683

公开(公告)号：EP3869272A1

公开(公告)日：2021-08-25

申请号：EP20158702.9

申请日：2020-02-21

申请人： ASML Netherlands B.V.

发明人： TEN KATE, Nicolaas ,  WINKELS, Koen, Gerhardus ,  HABETS, Michel, Ben, Isel

IPC分类号： G03F7/20 ,  H01L21/687

摘要： The disclosure relates to substrate tables for lithography and methods of handling a substrate. In one arrangement, a substrate table comprises one or more membranes. An actuation system deforms each membrane to change a height of a portion of the membrane. In another arrangement, a substrate table comprises one or more membranes and a clamping system for clamping a substrate to the substrate table, wherein the clamping deforms each membrane by pressing the substrate against the membrane.

公开(公告)号：EP3584801A1

公开(公告)日：2019-12-25

申请号：EP19190727.8

申请日：2016-11-03

申请人： ASML Netherlands B.V.

发明人： DE JAGER, Pieter, Willem, Herman ,  BIJLSMA, Sipke, Jacob ,  FRIJNS, Olav, Waldemar, Vladimir ,  NIKIPELOV, Andrey ,  TEN KATE, Nicolaas ,  DERKSEN, Antonius, Theodorus, Anna, Maria ,  VERSPAY, Jacobus, Johannus, Leonardus, Hendricus ,  LANSBERGEN, Robert, Gabriël, Maria ,  KASTELIJN, Aukje, Arianne, Annette

IPC分类号： G21G1/12 ,  G21K5/04 ,  G21K5/08 ,  G21K5/10

摘要： A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam (E) along a first path towards a first side of the target (30) and to direct a second portion of the electron beam (E) along a second path towards a second side of the target (30).