- 专利标题: MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS
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申请号: EP21199265.6申请日: 2014-09-15
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公开(公告)号: EP3971950A1公开(公告)日: 2022-03-23
- 发明人: WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
- 申请人: Kla-Tencor Corporation
- 申请人地址: US Milpitas, California 95035 One Technology Drive
- 代理机构: FRKelly
- 优先权: US201314043783 20131001
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; G01N21/88 ; G01N21/95 ; G01B11/00 ; G01N21/21 ; G01B11/06
摘要:
An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
公开/授权文献
- EP3971950B1 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEM 公开/授权日:2024-11-06
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