- 专利标题: DETECTOR SUBSTRATE, AN INSPECTION APPARATUS AND METHOD OF SAMPLE ASSESSMENT
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申请号: EP20217152.6申请日: 2020-12-23
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公开(公告)号: EP4020565A1公开(公告)日: 2022-06-29
- 发明人: WIELAND, Marco, Jan-Jaco , NIHTIANOV, Stoyan , VEENSTRA, Roy, Ramon , JIANG, Hui
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL 5500 AH Veldhoven P.O. Box 324
- 代理机构: ASML Netherlands B.V.
- 主分类号: H01L27/144
- IPC分类号: H01L27/144 ; H01L27/146 ; H01L31/115 ; H01J37/12 ; H01J37/153 ; H01J37/244 ; H01J37/28 ; H01J37/317
摘要:
There is provided a detector substrate for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of respective charged particle beams of a multi-beam. The detector substrate comprises: a sensor unit array. A sensor unit of the sensor unit array is adjacent a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array comprises an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit comprising a Trans Impedance Amplifier and/or an analogue to digital converter.
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