发明公开
- 专利标题: PLASMA TREATMENT APPARATUS
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申请号: EP22805746.9申请日: 2022-08-08
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公开(公告)号: EP4183367A1公开(公告)日: 2023-05-24
- 发明人: LIM, You Bong
- 申请人: Plasmapp Co., Ltd.
- 申请人地址: KR Yuseong-gu Daejeon 34141 111, 125, Gwahak-ro
- 代理机构: Frenkel, Matthias Alexander
- 优先权: KR20220064367 20220525
- 国际公布: WO2023043060 20230323
- 主分类号: A61C19/02
- IPC分类号: A61C19/02 ; A61C8/00 ; H05H1/46 ; A61C13/02 ; B65D43/02 ; B65D85/00 ; A61C19/00 ; H01F7/00 ; B65D81/18
摘要:
Provided is a plasma treatment apparatus that does not use a separate process gas by discharging low-pressure atmosphere formed in a sealed space in which a plasma surface treatment is performed. Therefore, by discharging the low-pressure atmosphere using a relatively low voltage, stable plasma with high surface treatment efficiency may be generated, and thus a plasma treatment apparatus may be configured economically and no operation and management costs due to the use of a process gas are incurred. Also, the safety and the effectiveness of a plasma surface treatment process to be applied in the medical industry are secured, and sterility may be secured and usability may be maximized.
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