- 专利标题: METHOD AND SYSTEM FOR MEASURING STRUCTURE BASED ON SPECTRUM
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申请号: EP23184723.7申请日: 2023-07-11
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公开(公告)号: EP4310444A1公开(公告)日: 2024-01-24
- 发明人: KIM, QHwan , KIM, Jaeyoon , NOH, Hyeonkyun , MA, Ami , LEE, Sunghee , CHANG, Kyubaik , CHEON, Wooyoung , JEONG, Jaehoon
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si, Gyeonggi-do 16677 129, Samsung-ro Yeongtong-gu
- 代理机构: Marks & Clerk LLP
- 优先权: KR20220089031 20220719
- 主分类号: G01B11/02
- IPC分类号: G01B11/02 ; G01B11/06
摘要:
A method for measuring a structure based on a spectrum, includes obtaining a first model that includes a first sub-model and a second sub-model following the first sub-model and is trained based on simulation data, generating a second model including a third sub-model identical to the first sub-model, training the second model based on sample spectrum data generated by measuring spectra of sample structures, and estimating, based on the trained second model, the structure from measured spectrum data generated by measuring a spectrum of the structure.
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