- 专利标题: ATOMIC LAYER DEPOSITION PROCESS FOR FABRICATING DIELECTRIC METASURFACES FOR WAVELENGTHS IN THE VISIBLE SPECTRUM
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申请号: EP24150732.6申请日: 2016-11-23
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公开(公告)号: EP4361312A3公开(公告)日: 2024-07-24
- 发明人: DEVLIN, Robert C. , KHORASANINEJAD, Mohammadreza , CAPASSO, Federico , PARK, Hongkun , HIGH, Alexander Arthur
- 申请人: President And Fellows Of Harvard College
- 申请人地址: US Cambridge, Massachusetts 02138 17 Quincy Street
- 专利权人: President And Fellows Of Harvard College
- 当前专利权人: President And Fellows Of Harvard College
- 当前专利权人地址: US Cambridge, Massachusetts 02138 17 Quincy Street
- 代理机构: Mewburn Ellis LLP
- 优先权: US 1562259243P 2015.11.24
- 分案原申请号: 16869282.0 2016.11.23
- 主分类号: G02B1/00
- IPC分类号: G02B1/00 ; G02B27/42 ; G03F1/50 ; H01L31/02 ; C23C16/455
摘要:
A method of fabricating a visible spectrum optical component includes: providing a substrate; forming a resist layer over a surface of the substrate; patterning the resist layer to form a patterned resist layer defining openings exposing portions of the surface of the substrate; performing deposition to form a dielectric film over the patterned resist layer and over the exposed portions of the surface of the substrate, wherein a top surface of the dielectric film is above a top surface of the patterned resist layer; removing a top portion of the dielectric film to expose the top surface of the patterned resist layer and top surfaces of dielectric units within the openings of the patterned resist layer; and removing the patterned resist layer to retain the dielectric units over the substrate.
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IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B1/00 | 按制造材料区分的光学元件;用于光学元件的光学涂层 |