Provided in the present application are a method and apparatus for preparing a quantum chip, and an electronic device, a computer-readable storage medium, a computer program product and a quantum chip. The method comprises: determining an initial intrinsic frequency of a chip substrate; on the basis of a comparison result between the value of the initial intrinsic frequency and the value of a quantum working frequency, performing pattern etching treatment on a first surface of the chip substrate, so as to obtain a chip substrate which has a complete second surface and has a target pattern on the first surface, wherein the quantum working frequency is the working frequency of quantum bits of a quantum circuit, the second surface is opposite the first surface, and the target pattern is a pattern when the difference value between the intrinsic frequency of the chip substrate and the quantum working frequency is the maximum; and etching the second surface of the chip substrate which has been subjected to the pattern etching treatment,, so as to form the quantum circuit, thereby forming a quantum chip.