Invention Publication
EP4491688A1 COMPOUND
审中-公开
- Patent Title: COMPOUND
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Application No.: EP23767130.0Application Date: 2023-03-07
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Publication No.: EP4491688A1Publication Date: 2025-01-15
- Inventor: PARK, Jun Hyoung , KIM, Hyun Cheol
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Yeongdeungpo-gu Seoul 07336 128 Yeoui-daero
- Agency: Goddar, Heinz J.
- Priority: KR20220028888 20220307
- International Announcement: WO2023172029 20230914
- Main IPC: C09D183/06
- IPC: C09D183/06 ; C09D5/20 ; C09J7/40 ; C08G77/20 ; C08G77/12 ; C08L83/06 ; C08K5/5419
Abstract:
The present application can provide a compound, a release composition, a release layer, a release film, and a pressure-sensitive adhesive film. The present application can provide a compound that can form a release layer which enables to exhibit an appropriate level of release peel force, and has an excellent bonding force with a base film and excellent solvent resistance. In addition, the present application can provide a compound that when the release layer has been formed, the release layer exhibits a stable residual adhesion rate even in the case of being repeatedly applied to a pressure-sensitive adhesive layer, and the like. The present application can also provide a release composition and a release layer comprising the compound, and a release film and a pressure-sensitive adhesive film comprising the release layer.
Information query
IPC分类: