发明专利
JP2004046188A X-ray photo-sensitive water-based photothermographic material and its use method
审中-公开
X射线光敏水性光刻胶材料及其使用方法
- 专利标题： X-ray photo-sensitive water-based photothermographic material and its use method
- 专利标题（中）： X射线光敏水性光刻胶材料及其使用方法
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申请号： JP2003194346申请日： 2003-07-09
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公开(公告)号： JP2004046188A公开(公告)日： 2004-02-12
- 发明人: SIMPSON SHARON M , MOORE WILLIAM E
- 申请人： Eastman Kodak Co , イーストマン コダック カンパニー
- 专利权人： Eastman Kodak Co,イーストマン コダック カンパニー
- 当前专利权人： Eastman Kodak Co,イーストマン コダック カンパニー
- 优先权： US19339502 2002-07-11
- 主分类号： G03C1/498
- IPC分类号： G03C1/498 ; G03C5/08 ; G03C5/17
摘要：
PROBLEM TO BE SOLVED: To provide an aqueous-based photothermographic material sensitive to visible and X-ray radiation and containing an X-ray photosensitive phosphor in association with chemically sensitized silver halide particles. SOLUTION: The silver halide particles are characterized in that: at least 70% of the whole projection area of the photosensitive silver halide particles is possessed by tabular silver halide particles containing 70 mol% bromides with respect to the whole silver halides; the rest of the silver halides are iodides or chlorides; and the tabular particles have 0.02 μm to 0.10 μm average thickness, 0.5 μm to 8 μm equivalent circular diameter and at least 5:1 aspect ratio. COPYRIGHT: (C)2004,JPO
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