The present invention relates to a method of forming a high resolution pattern of material on a substrate by a catalytic reaction. Occurs on the surface of the substrate material, such as self-catalytic coating reaction, there are many types of catalytic reaction, using such reactions, or activate raise gas, the reaction rate in the liquid or solid environment be able to. Generally, in such a reaction, the catalyst material used is applied to the entire of the substrate material, or acts on whole, as a result, the reaction occurs throughout the substrate. Accordingly, the reaction is, if you need to occur only in a portion of the surface of the substrate, it is necessary to perform additional processes, such as etching or photolithography. These things, increases the complexity of the reaction, affects the cost to generate the waste. Therefore, to alleviate some of the above disadvantages, it is to provide a method of preparing a substrate material such that it can start the catalytic reaction on a predetermined region of the substrate, which is an object of the present invention.