发明专利
- 专利标题： Manufacturing method of line device
- 专利标题（中）： 线装置的制造方法
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申请号： JP2014007143申请日： 2014-01-17
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公开(公告)号： JP2014103411A公开(公告)日： 2014-06-05
- 发明人: HAYASHI SHIGEO , CHOU CHIEN-KANG , CHEN KE-HUNG
- 申请人： Megit Acquisition Corp , メジット・アクイジション・コーポレーションMegit Acquisition Corp.
- 专利权人： Megit Acquisition Corp,メジット・アクイジション・コーポレーションMegit Acquisition Corp.
- 当前专利权人： Megit Acquisition Corp,メジット・アクイジション・コーポレーションＭｅｇｉｔ Ａｃｑｕｉｓｉｔｉｏｎ Ｃｏｒｐ．
- 优先权： US69354905 2005-06-24
- 主分类号： H01L21/3205
- IPC分类号： H01L21/3205 ; H01L21/768 ; H01L23/12 ; H01L23/522
摘要：
PROBLEM TO BE SOLVED: To provide a manufacturing process of a line device structure, which relieves stress and makes interval distance of a contact window structure small, and to provide the structure.SOLUTION: A line device structure comprises a substrate, a first metal pole 68 and a second metal pole. The first metal pole 68 is positioned on the substrate. When maximum side dimension Hw of the first metal pole 68 is divided by height Ht of the first metal pole 68, a quotient is smaller than four. The height of the first metal pole 68 is 20 μm to 300 μm. The second metal pole is positioned on the substrate. When maximum side dimension of the second metal pole is divided by height of the second metal pole, a quotient is smaller than four. Distance Hb from a center point of the first metal pole to a center point of the second metal pole is 10 μm to 250 μm.
公开/授权文献
- JP1511206S JP1511206S - 公开/授权日：2016-10-31
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