图案化工艺包括（1）将第一正性抗蚀剂组合物涂覆在基材上，烘烤，曝光，曝光后烘烤和碱显影以形成第一抗蚀剂图案，（2）将抗蚀剂改性组合物涂覆到第一抗蚀剂图案上 加热进行改性处理，（3）涂布第二正性抗蚀剂组合物，烘烤，曝光，曝光后烘烤和碱显影以形成第二抗蚀剂图案。 抗蚀剂改性组合物包括含有式（1）的重复单元的基础树脂，其中A1是亚烷基，R1是H或甲基，R2是烷基或键合在一起形成含氮杂环，和醇类溶剂。

The invention 1) exposed after applying the positive resist composition comprising a polymer having a repeating unit with a lactone structure-containing repeating units to the alkali solubility increases by the action of an acid compound to the substrate to form a first resist film by, and heat treatment , and the step of forming a first resist pattern by alkali development after a heat treatment,
2) The application of the resist composition on the modified first resist pattern, and the heating step is performed by a modified process,
3) a step of applying a second positive resist composition thereon, and exposure after heat treatment, and forming a second resist pattern by alkali development after heat treatment
And to include a base resin and an alcohol-based solvent having a repeating unit represented by the formula (1) as a composition for a resist modified for use in the pattern formation method comprising a.

(A ¹ that is an ether group-containing alkylene group is available, R ¹ is H or a methyl group, R ² may also form an alkyl group, or a heterocyclic ring containing the nitrogen atom to be bonded to each other)
According to the invention, the first light enough of the pattern is activated, and after holding second patterning becomes possible, it is possible to double patterning process for machining the substrate in a second time exposure and a single dry etching.