本发明的目的是一种光掩模干燥装置，其包括：密封室，其包含至少一个光掩模，用于在所述室内建立和保持真空的泵送单元，放置在所述室内的光掩模的支撑件，放置在其中的红外辐射装置 在所述室内，用于将气体注入所述室的系统，其特征在于，所述红外辐射装置包括分布在平行于光掩模平面的平面中的多个红外辐射源，使得从光掩模到红外线的距离 辐射装置由以下关系给出：D = 1.5×d其中D是包含红外辐射源的平面与光掩模之间的距离，d是两个相邻红外辐射源的中心点之间的距离，并且其中气体 喷射系统包括分布在平行于光掩模平面的平面内的多个气体喷射器， 注射器遵循关于光掩模中心点的90°旋转不变性。

Aspect of the present invention is a device for drying a photo-mask, the pumping unit (3) for providing a vacuum and maintained in at least one of the photomask and the closed chamber (2) including (13), the chamber (2) and, the chamber 2 and the photomask (13) holder (12) disposed therein, and an infrared emitting unit (6) disposed in the chamber (2) for injecting gas into the chamber (2) a photomask, the drying apparatus comprising a system (10). According to the invention, the infrared ray irradiation means is the distance to the infrared emission means relational expression from the photomask (13) D = 1.5 × d (where D is the distance between the plane and the photomask (13) comprising an infrared ray radiation source 6, and , d comprises two infrared is the distance between the center point of the radiation source (6)), a plurality of infrared radiation sources (6) are distributed in parallel planes so that the plane of the photo-mask 13 is determined by the gas injection system (10 ) comprises an injector 30, a photomask center point (a plurality of gas injectors (30 distributed in a plane parallel to the plane of the photomask 13 to a constant 90 ° rotation with a focus on 13)) of.