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KR1020160023566A 신규 오늄염 화합물, 레지스트 조성물 및 패턴 형성 방법 审中-实审
新型盐酸盐化合物，耐腐蚀组合物和图案形成工艺

신규 오늄염 화합물, 레지스트 조성물 및 패턴 형성 방법
Abstract:
식 (1)로표시되는오늄염화합물.[Z는식 (a)로표시되는술포늄양이온또는식 (b)로표시되는요오도늄양이온.는, 질소원자를개재하는탄소수 2∼5의환상구조를나타낸다. 식 (1)에있어서는, 치환기 -L-CO(L은단결합또는 2가탄화수소기)를반드시하나갖는다.]본발명의레지스트조성물에포함되는오늄염화합물은, 산확산제어제로서양호하게기능하고, 결과적으로 MEF 및 LWR이작으며, 초점심도가우수하여고해상인패턴프로파일을구축할수 있다.
Abstract(Chinese):

本发明涉及由式（1）表示的鎓盐组合物。 在化学式（1）中，Z +是由式（a）表示的锍的正离子或由式（b）表示的碘的正离子。 式（2）表示碳原子数为2〜5的氮原子的环状结构。 式（1）必须包括一个取代基-L-CO 2 - ，其中L是单键或二价烃基。 根据本发明，抗蚀剂组合物中包含的鎓盐组合物作为酸扩散抑制剂有利地起作用，因此具有低的MEF和LWR，并且显示出优异的聚焦深度，从而能够构建高分辨率图案轮廓 。

Abstract(English):

[MEANS FOR SOLVING PROBLEMS] onium salt compound represented by the formula (1).

[Z + is iodonium cation represented by the sulfonium cation or a group represented by the formula (b) represented by the formula (a).

Represent a cyclic structure having a carbon number of 2 to 5, which via the nitrogen atom.
In the formula (1), the substituent -L-CO 2 - (L group is a single bond or a divalent hydrocarbon group) having necessarily one.
Effects onium salt compound contained in the resist composition of the present invention, preferably functions as a controlling agent, an acid diffusion and was consequently in the MEF and LWR small, the focus is the depth to be superior to build a high resolution of the pattern profile.

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