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KR20210030486A 멀티캐소드 증착 시스템 审中-公开

  • 专利标题： 멀티캐소드 증착 시스템
  • 专利标题（英）： KR20210030486A - Multi-cathode deposition system
  • 申请号： KR20217006853
    申请日： 2019-08-09
  • 公开(公告)号： KR20210030486A
    公开(公告)日： 2021-03-17
  • 优先权： US201862717294 2018-08-10
  • 主分类号： C23C14/56
  • IPC分类号： C23C14/56 ;  C23C14/34 ;  H01J37/32 ;  H01J37/34
멀티캐소드 증착 시스템
摘要：
PVD(physical vapor deposition) 챔버및 그동작방법이개시된다. 입자결함들을감소시키는윤곽들, 프로세싱결함들을감소시키기위한온도제어및/또는측정및/또는전압입자트랩들중 하나이상을포함하는챔버를제공하는방법들및 챔버들이설명된다.
摘要（英）：

A physical vapor deposition (PVD) chamber and a method of operating the same are disclosed. Methods and chambers are described for providing a chamber comprising one or more of contours to reduce particle defects, temperature control and/or measurement and/or voltage particle traps to reduce processing defects.

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