Invention Grant
- Patent Title: Lithographic apparatus, spectral purity filter and device manufacturing method
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Application No.: US15432698Application Date: 2017-02-14
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Publication No.: US10001709B2Publication Date: 2018-06-19
- Inventor: Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Antonius Johannes Josephus Van Dijsseldonk , Wilhelmus Petrus De Boeij
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/18 ; G02B1/11 ; G02B5/28 ; G21K1/06 ; H05G2/00
Abstract:
A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
Public/Granted literature
- US20170160646A1 Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method Public/Granted day:2017-06-08
Information query
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